MPCVD grown diamond deposition equipment

Application

Preparation of high-quality single crystal diamond;

Preparation of high-quality polycrystalline free-standing diamond films;

Preparation of high quality polycrystalline diamond films;

Preparation of various carbon nano films such as graphene, carbon nanotubes, fullerenes and diamond films.

Features

a.         Stainless steel cavity type 6kw microwave plasma equipment, high power density;

b.        The water-cooled substrate stage and the water-cooled metal chamber ensure the system can work stably for a long time;

c.         The substrate temperature is achieved by microwave plasma self-heating;

d.        The vacuum measuring instrument adopts a full-range vacuum gauge, which can accurately measure the background vacuum and working gas pressure;

e.         The vacuum pump and valve adopt turbo molecular pump (the ultimate vacuum is 1×10-5Pa) and the rotary vane mechanical vacuum pump (the ultimate vacuum is 1Pa), and the system can automatically control the deposition pressure;

f.         Cooling water circulation system to ensure long-term safe and stable operation of the device under high power;

g.        15-inch touch screen, PLC automatic control, can set the temperature or pressure to be constant, can save and reuse up to 20 sets of process files;

Fully automatic process control module, which can stably and reliably prepare high-quality diamond films and crystals

Technical specifications

System installation requirements

The following installation conditions are provided by the customer:

1. Gas connection

a) Working gas path: users need to provide four channels of CH4, H2, N2 and O2, the gas pressure is 0.2MPa, and the gas purity is determined by the user according to the process requirements

b)  Gas interface: 1/4"VCR interface

2. Power supply

a) Power supply voltage: AC 380V (± 10%), frequency 50 Hz, three-phase four wire, There is independent ground wire in the room, the efficiency of grounding resistance is 4 Ω, and the maximum power is 20kW

b) It is recommended to reserve a separate air switch on the wall 1 meter away from each equipment. The specification of air switch is 4P32A and with leakage protection.

c) Before making any connections, the electronic system in the system should be shut down.

3. Cooling water

Customers need to provide their own industrial chillers：

a) Cooling capacity：10kw

b) Flow rate：>30L/min

c) Recommended inlet water temperature：20℃，maximum inlet water temperature<25℃

d) Inlet water pressure：≥5.0 kg/cm² （or head>45 m）

e) System water inlet and outlet connection：φ19mm（pagoda joint）

f) In order to avoid problems caused by corrosion, pure water is recommended

4. Compressed air demand for system control

a) Compressed dry air (CDA): the system needs to provide CDA gas path with gas pressure ≥ 0.4MPa.

b) Interface: φ 8 quick plug (pneumatic quick plug)

5. Equipment exhaust

a) Customers need to prepare their own exhaust channels, and the exhaust port of the equipment is connected to the exhaust channel through the KF25 interface.

Check before acceptance

1. Vacuum leakage: the leakage rate of vacuum chamber is less than 0.1torr/12h

2. Microwave leakage: the measured value is less than 2MW/cm² (when the microwave output is 5kW)

3. Water pipe leakage: make sure the water pipe is not leaking

4. System test: the system can start and run normally, and the plasma fireball is even and stable

Warranty

1.Grantee period is 12 months from the date of acceptance of the system or 14 months from date of shipment (Airwaybill date), whichever comes first.

2.The following are not covered by warrantee:

a)Unauthorized modification of hardware/software.

b)Improper operation which are not mentioned in the user manual.

c)Consumable parts

3. Customers need to ensure that the construction progress of public facilities such as gas, electricity and water will not affect the installation and commissioning of the equipment and the delay caused by this will not extend the warranty period.